High laser induced damage threshold photoresists for nano-imprint and 3D multi-photon lithography

Abstract Optics manufacturing technology is predicted to play a major role in the future production of integrated photonic circuits. One drawbacks realization circuits damage optical materials by intense laser pulses. Here, we report on preparation series organic–inorganic hybrid photoresists that exhibit enhanced laser-induced threshold. These showed be candidates for fabrication micro-optical elements (MOEs) using three-dimensional multiphoton lithography. Moreover, they demonstrate pattern ability nanoimprint lithography, making them suitable mass MOEs.